您当前位置：首页 > 国际期刊-PLASMA CHEMISTRY AND PLASMA PROCESSING期刊投稿发表详细信息

PLASMA CHEMISTRY AND PLASMA PROCESSING Q2

期刊收录：
SCIE
Scopus

基本信息

期刊ISSN：
0272-4324
期刊简拼：
PLASMA CHEM PLASMA P
年发文章数：
123
E-ISSN：
1572-8986
Gold OA文章占比
14.18%
研究文章占比：
95.12%
是否OA：
No
Jcr分区：
Q2
中科院分区：
3区

出版信息

出版商：
Springer US
涉及研究方向：
工程技术-工程：化工
出版国家：
UNITED STATES
出版语言：
English
出版周期：
Quarterly
出版年份：
1981

2023-2024最新影响因子:2.6
自引率:19.20%
五年影响因子:2.9
JCI期刊引文指标:0.65
h-index:57
CiteScore:5.90

期刊关键词

2区 SCIE Scopus 物理与天体物理 3区 ENGINEERING CHEMICAL 工程：化工 PHYSICS APPLIED 物理：应用 FLUIDS & PLASMAS 物理：流体与等离子体

期刊简介

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

《PLASMA CHEMISTRY AND PLASMA PROCESSING》期刊已被查看：次
期刊简写：PLASMA CHEM PLASMA P

此期刊被最新的JCR期刊SCIE收录