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INTERNATIONAL JOURNAL OF APPLIED ELECTROMAGNETICS AND MECHANICS Q4

期刊收录：
SCIE
Scopus

基本信息

期刊ISSN：
1383-5416
期刊简拼：
INT J APPL ELECTROM
年发文章数：
136
E-ISSN：
Gold OA文章占比
0.85%
研究文章占比：
95.59%
是否OA：
No
Jcr分区：
Q4
中科院分区：
4区

出版信息

出版商：
IOS Press
涉及研究方向：
物理-工程：电子与电气
出版国家：
NETHERLANDS
出版语言：
English
出版周期：
Quarterly
出版年份：

2023-2024最新影响因子:1.1
自引率:18.20%
五年影响因子:0.7
JCI期刊引文指标:0.16
h-index:26
CiteScore:1.70

期刊关键词

4区 SCIE Scopus 工程技术 ENGINEERING ELECTRICAL & ELECTRONIC 工程：电子与电气 MECHANICS 力学 PHYSICS APPLIED 物理：应用

期刊简介

The aim of the International Journal of Applied Electromagnetics and Mechanics is to contribute to intersciences coupling applied electromagnetics, mechanics and materials. The journal also intends to stimulate the further development of current technology in industry. The main subjects covered by the journal are:

Physics and mechanics of electromagnetic materials and devices
Computational electromagnetics in materials and devices
Applications of electromagnetic fields and materials
The three interrelated key subjects – electromagnetics, mechanics and materials - include the following aspects: electromagnetic NDE, electromagnetic machines and devices, electromagnetic materials and structures, electromagnetic fluids, magnetoelastic effects and magnetosolid mechanics, magnetic levitations, electromagnetic propulsion, bioelectromagnetics, and inverse problems in electromagnetics.

The editorial policy is to combine information and experience from both the latest high technology fields and as well as the well-established technologies within applied electromagnetics.

《INTERNATIONAL JOURNAL OF APPLIED ELECTROMAGNETICS AND MECHANICS》期刊已被查看：次
期刊简写：INT J APPL ELECTROM

此期刊被最新的JCR期刊SCIE收录