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JOURNAL OF LASER APPLICATIONS Q3

期刊收录：
SCIE
Scopus

基本信息

期刊ISSN：
1042-346X
期刊简拼：
J LASER APPL
年发文章数：
166
E-ISSN：
1938-1387
Gold OA文章占比
17.18%
研究文章占比：
96.99%
是否OA：
No
Jcr分区：
Q3
中科院分区：
4区

出版信息

出版商：
Laser Institute of America
涉及研究方向：
物理-光学
出版国家：
UNITED STATES
出版语言：
English
出版周期：
Quarterly
出版年份：
1988

2023-2024最新影响因子:1.7
自引率:17.60%
五年影响因子:1.9
JCI期刊引文指标:0.45
h-index:43
CiteScore:3.60

期刊关键词

3区 SCIE Scopus 工程技术 4区 MATERIALS SCIENCE MULTIDISCIPLINARY 材料科学：综合 OPTICS 光学 PHYSICS APPLIED 物理：应用

期刊简介

The Journal of Laser Applications (JLA) is the scientific platform of the Laser Institute of America (LIA) and is published in cooperation with AIP Publishing. The high-quality articles cover a broad range from fundamental and applied research and development to industrial applications. Therefore, JLA is a reflection of the state-of-R&D in photonic production, sensing and measurement as well as Laser safety.
The following international and well known first-class scientists serve as allocated Editors in 9 new categories:

High Precision Materials Processing with Ultrafast Lasers
Laser Additive Manufacturing
High Power Materials Processing with High Brightness Lasers
Emerging Applications of Laser Technologies in High-performance/Multi-function Materials and Structures
Surface Modification
Lasers in Nanomanufacturing / Nanophotonics & Thin Film Technology
Spectroscopy / Imaging / Diagnostics / Measurements
Laser Systems and Markets
Medical Applications & Safety
Thermal Transportation
Nanomaterials and Nanoprocessing
Laser applications in Microelectronics.

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期刊简写：J LASER APPL

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